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Altair Nanotechnologies Awarded European Patent


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Newly Patented Process for Design, Development, and Production of Titanium Oxide Structures Customized for Titanium Metal Production

RENO, NV, 03/03/2005, Altair Nanotechnologies, Inc. (NASDAQ: ALTI), a developer and manufacturer of innovative nanomaterial products, today announced the company was awarded a new European patent entitled “Method for Producing Catalyst Structures” by the European Patent Office. The new patent describes the process for making microporous structures that can be used as catalyst supports, or as electrode materials, in connection with titanium metal production and other processes.

“This patent strengthens our intellectual property position, further differentiates Altair within the rapidly growing nanotechnology market and illustrates our commitment to bring nanotechnology out of the laboratory and into commercialization,” said Dr. Alan J. Gotcher, Chief Executive Officer of Altair Nanotechnologies. “The technology described in this patent is being applied in a development program, using titanium dioxide electrodes manufactured by Altair, to produce titanium metal by a more cost-effective process. This program is being conducted in conjunction with our partner, Titanium Metals Corporation, under a U.S. Defense Advanced Research Projects Agency (DARPA) contract.”

The DARPA contract was awarded to advance the Fray-Farthing-Chen (FFC) Cambridge Titanium Process technology for the electrochemical production of titanium metal. The FFC process promises to significantly reduce the cost of manufacturing titanium metal and to dramatically expand titanium use in a wider range of applications that include lightweight armored military vehicles, the manufacture of automotive and aerospace parts and components for power generation, oil and gas drilling, and lightweight and durable consumer goods.

Altair Nanotechnologies, Inc.

Although an emerging field, nanotechnology is already having a unique impact on several industry sectors. Altair Nanotechnologies is positioning itself through product innovation to become a leading supplier of ceramic, metal oxide-based nanomaterial technology and nanomaterials worldwide. Altair owns robust proprietary technology platforms for manufacturing a variety of crystalline and non-crystalline nano-materials of unique structure, performance, quality and cost. Altair has installed semi-works capability with a capacity to produce hundreds of tons of nano-materials.

The company is organized into two divisions: Life Sciences and Performance Materials.

The Life Sciences Division is pursuing market applications in pharmaceuticals, drug delivery, dental materials, cosmetics and other medical markets. The Performance Materials Division is pursuing market applications in Advanced Materials for Paints and Coatings (titanium pigments and thermal spray coatings), Advanced Materials for Improving Process Technologies (titanium metal manufacturing, catalysts and water treatment), Advanced Materials for Alternative Energy (high performance batteries, fuel cell and photovoltaics) and other high performance material applications. For additional information on Altair and its nano-materials, visit www.altairnano.com.

Altair Nanotechnologies, Inc.®, Altair Nanomaterials™, Altairnano™, TiNano®, RenaZorb™, NanoCheck™, TiNano Spheres™ and the Hydrochloride Pigment Process™ are trademarks or registered trademarks of Altair Nanotechnologies, Inc.

Forward-Looking Statements

This release may contain forward-looking statements as well as historical information. Forward-looking statements, which are included in accordance with the “safe harbor” provisions of the Private Securities Litigation Reform Act of 1995, may involve risks, uncertainties and other factors that may cause the company’s actual results and performance in future periods to be materially different from any future results or performance suggested by the forward-looking statements in this release. These risks and uncertainties include, without limitation, the risks that further testing will reveal that the process described in the patent is not effective or not compatible with related technologies; that the DARPA-sponsored development program will not be renewed; that a superior feedstock technology for the FFC process or other relevant processes will be discovered; that the FFC process development program will be unsuccessful; that Altair’s other development stage products will not be developed to the point of commercialization and that, even if commercialized, no market will exist for such products or Altair will fail to effectively market to customers in a market. In addition, other risks are identified in the company’s most recent Annual Report on Form 10-K, as filed with the SEC. Such forward-looking statements speak only as of the date of this release. The company expressly disclaims any obligation to update or revise any forward-looking statements found herein to reflect any changes in company expectations or results or any change in events.



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