Nikon Introduces the Litho Booster 1000, a Next-Generation Alignment Station Designed to Facilitate Breakthrough Overlay Accuracy for Advanced 3D Devices

Nikon Corporation announced the development of the Litho Booster 1000, its latest alignment station model engineered to enable exceptional overlay accuracy in semiconductor manufacturing. The Litho Booster 1000 provides dense sampling measurements on each wafer and feeds forward precise correction data directly to the lithography system before exposure, improving process control and delivering higher production yield. Nikon expects to launch the system in the second half of 2026.

Designed for maximum flexibility, the Litho Booster 1000 supports semiconductor lithography systems from both Nikon and other Lithography equipment suppliers. Nikon has been delivering alignment station technology to meet customer’s overlay requirements since 2018; the new model provides a major step forward in capability and performance.

With the rapid adoption of 3D device structures, across many semiconductor market segments such as CMOS image sensors, logic devices, NAND flash, and soon DRAM, the industry is facing increasing overlay challenges caused by wafer deformation and misalignment during multi-layer processing and wafer-to-wafer bonding. These steps demand higher-density, more precise wafer measurements to maintain tight overlay tolerances across increasingly complex stacks.

The Litho Booster 1000 addresses these challenges with enhanced multi-point and absolute measurement accuracy resulting in improved device quality and yield, whilst maintaining high productivity throughout the manufacturing process. Development of the system has been supported in part by research results from a project commissioned by Japan’s New Energy and Industrial Technology Development Organization (NEDO).

The information is current as of the date of publication. It is subject to change without notice.