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Toshiba to Accelerate Development of Nano Imprint Lithography
2/5/2015 11:08:35 AM
Toshiba today announced that it has entered into a definitive agreement with SK hynix on joint development of Nano Imprint Lithography (NIL). Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017. Today’s announcement builds on an MOU …

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