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ChemImage Awarded a Phase I SBIR Grant to Study SiC-Based Materials


Pittsburgh, PA (ChemImage Corporation) December 7th, 2007 – ChemImage, a leader in Chemical Imaging technology, recently received an SBIR Phase I grant for studying Silicon Carbide (SiC) based materials for space-based optics.

This Phase I grant will fund a ChemImage research and development project to study the chemical composition, crystalline structure, stress/strain, and subsurface damage to Silicon Carbide based substrates and optics. Our patented wide-field imaging technology will be employed to reveal heterogeneity in these substrates at micrometer resolution.

David Tuschel, Director of Product and Applications Development, will lead a team working to develop a method for real time inspection of SiC-based substrates and optics. Mr. Tuschel commented, “ChemImage’s full field-of-view spectral imaging is especially conducive to exploratory work, offering the desired spectral and spatial sampling for chemical inspection that can be used for nondestructive evaluation for fabrication.”

The success of the first phase of this project will enable development of technology to support the United States Air Force to develop SiC-based optics for defense purposes. In addition, this technology can be used to enable material vendors to better support their customers by understanding and controlling the relationship between structural and material properties.

“Based on our preliminary results, we are looking forward to a Phase II that will enable us to begin the commercialization of application specific instruments for characterizing these SiC-based optics,” Mr. Tuschel stated.


 chemical imaging
 SBIR Phase 1
 material characterization

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