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OKI Delivers Additional Exhaust Gas Treatment Equipmentfor ON Semiconductor’s European plants

Unique filter design realizes extended maintenance-free use


Tokyo, Japan – WEBWIRE
KGT-3MM-AP exhaust gas treatment equipment
KGT-3MM-AP exhaust gas treatment equipment

OKI Engineering, provider of reliability evaluations and environmental conservation technologies for the OKI Group, recently delivered an additional unit of KGT-3MM-AP exhaust gas treatment equipment for atmospheric pressure CVD(*1) manufacturing equipment to semiconductor manufacturer ON Semiconductor’s European plants. OKI Engineering’s exhaust gas treatment equipment adopt a filter designed to minimize filter clogging, allowing extended maintenance-free use, ultimately contributing to production efficiency and helping to maintain the semiconductor manufacturers’ production environment.

Thus, it ensures reliability and consistency in the CVD thin film manufacturing line, ultimately helping to maintain the customer’s production environment.

In the manufacture of power devices such as Power FET(*2) and IGBT(*3) atmospheric pressure CVD manufacturing equipment is vital at the stage of insulating film manufacture. However, this equipment uses harmful gases and requires exhaust gas processing.

OKI Engineering ’s KGT-3MM-AP exhaust gas treatment contains a special stainless steel filter, which minimizes filter clogging and helps remove the harmful gases and particulate matter used with atmospheric pressure CVD manufacturing equipment. This extends maintenance-free use, improve scrubbing efficiency. The micromanometer used for pressure control was designed specifically for CVD gas use. Inverter control for the exhaust fan ensures the constant exhaust pressure essential for atmospheric pressure CVD thin film manufacture and extended operational reliability and consistency.

OKI Engineering has added a newly developed function as an option, which resets abnormalities in the atmospheric pressure CVD equipment by detecting pressure abnormality occurred during maintenance, in turn, enhancing customer satisfaction.

“In 2009, OKI Engineering delivered the KGT-3MM-AP to ON Semiconductor for the first time, as an exhaust gas processor for Amaya continuous atmospheric pressure CVD manufacturing equipment,” says Yutaka Asai, President of OKI Engineering. “This latest order for ON Semiconductor’s European plants was prompted by ON semiconductor’s satisfaction with the processor’s pressure control configuration and exhaust gas scrubbing efficiency and by the benefits of consistent, trouble-free CVD thin film manufacture. Introduction of the treatment equipment ensures consistent film thickness distributions for CVD thin films at ON Semiconductor’s European plants. It also contributes to enhancing factory productivity.”

Moving forward, OKI Engineering will expand reach into Europe and new regions including Southeast Asia.

KGT-3MM-APP Specification
Product name: Exhaust Gas Treatment Equipment for atmospheric pressure CVD
Model: KGT-XMM-AP (X:1,3,10,S)
Process capacity: Xm³/min (X:1,3,10,Special Specification)
Pressure control: -0.15 to -0.40KPa
Purpose: atmospheric pressure CVD, solar cells, wafer manufacturing

Related information


About ON Semiconductor
Company name: ON Semiconductor
Headquartered: Phoenix, Arizona. USA
President: Keith D. Jackson
Business: Leading-edge supplier of high-functional silicon solutions for electronic devices with high energy efficiency.
URL http://www.onsemi.com

About Amaya Co., Ltd.
Company name: Amaya Co., Ltd
Headquartered: Saitama Prefecture, Japan
President: Kentaro Yoshioka
Business: Manufacture and installation of atmospheric pressure CVD which enables to form SiH4 and TEOS NSG film, PSG film and BPSG film to be used for semiconductors and solar cells
http://www.amaya-cvd.co.jp/index_e.html

Glossary
  • *1 CVD

    CVD (chemical vapor deposition) is a vapor deposition method for producing thin films using various materials on a heated substrate.

  • *2 Power FET

    A power FET (power field-effect transistor) is a MOSFET(*4) designed to handle high power. Offering faster switching and higher conversion efficiency in low-voltage ranges than other power devices, power FETs are used in applications such as switching power supplies and DC-DC converters up to 200 V.

  • *3 IGBT

    Used in power control applications, an IGBT (Insulated Gate Bipolar Transistor) is a semiconductor device in the form of a bipolar transistor incorporating a MOSFET for the gate.

  • *4 MOSFET

    MOSFET (metal-oxide semiconductor field-effect transistor) is a type of field-effect transistor (FET) and the most common device currently used in LSIs. Silicon is the material used most often.



About OKI Electric Industry (OKI)

Founded in 1881, OKI Electric Industry is Japan’s leading telecommunications manufacturer in the Info-telecom field. Headquartered in Tokyo, Japan, OKI provides top-quality products, technologies, and solutions to customers through its info-telecom systems and printer operations. Its various business divisions function synergistically to bring to market exciting new products and technologies that meet a wide range of customer needs in various sectors. Visit OKI’s global website at http://www.oki.com/.

  • The names of the companies and products mentioned in this document are the trademarks or registered trademarks of the respective companies and organizations.



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